The ASM LVC-414-3 54-107950A15 is a high-precision liquid vapor mass flow controller designed for integration within semiconductor wafer processing equipment, particularly Chemical Vapor Deposition (CVD) and atomic layer deposition (ALD) tool clusters. The module acts as an intelligent sub-component that precisely measures and regulates the exact mass flow of carrier gases as they pass through chemical bubblers to pick up and distribute precursor dopants into the processing chamber. Built with robust, high-purity internal chemical-resistant gas pathways and an analog/digital control interface, the LVC-414-3 prevents precursor condensation, maintains highly repeatable vapor-to-gas concentration ratios, and ensures film uniformity and process stability under critical cleanroom vacuum environments.

Standard Operational Logic Power Supply: ±15V DC

Command / Setpoint Input Interface: 0 to 5 VDC Analog

Output Flow Monitoring Interface: 0 to 5 VDC Analog

Operating Ambient Temperature: 5°C to 50°C

Maximum System Pressure Rating: 10 bar

Leak Integrity Standard: ≤ 1 × 10⁻⁹ atm·cc/sec Helium

AnyBus (Gateway)

Industrial low-frequency screen

Remote input / output module (RTU)

Industrial control related ancillary products

Industrial PC (IPC)

Human-machine interface

Programmable Logic Controller (PLC)

Lowcapacity hard drives for industrial use SCSI

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