The Pall GLFPF3000VMF4 is an ultra-high-purity, in-line gas filter assembly designed specifically for point-of-use filtration in semiconductor and microelectronic process gas lines. It features an electropolished 316L stainless steel housing with a superior internal surface finish to prevent particle shedding. Inside, it houses an all-fluoropolymer filtration element that offers exceptional chemical compatibility with inert, toxic, and highly corrosive specialty gases.

u Electrical Ratings: 0 A / 0 V

u Maximum Operating Pressure: 20.7 MPa at 121 °C

u Maximum Operating Temperature: 121 °C (250 °F)

u Outgassing Profiles: < 10 ppb

u Fitting Connection: 1/4" VCR (Gasket Seal)

❖ Semiconductor Wafer Fabrication: Installed directly at point-of-use (POU) tool drops to remove sub-micron particulate contamination from critical deposition, etching, and photolithography process gases.

❖ Ultra-High Purity (UHP) Gas Cabinets: Integrated within bulk gas delivery manifolds, purge panels, and gas cabinets handling highly reactive, corrosive, or toxic gases.

❖ Cleanroom Instrumentation Isolation: Protecting fine-tolerance mass flow controllers (MFCs), pressure regulators, and analytical sniffing instruments from upstream particulate debris.

FS-TSDO-04UNI

F2DO1602

NFBU200-S05 S2

9907-018

FS-IOBUS-CPIO

F8650X

NFCCC01

5438-667

FC-QPP-0001 V1.3

HIMAX X-CPU01

AAI135-H00 S1

5462-916

FC-USI-0001 V1.3

F60CPU03

CP401-10 S1

5464-211

FS-TSGAS-1624

F3 AIO 84 01

NFBU200-S05 S2

5464-334

FS-IOBUS-CPIO

Z7126

NFCP100-S05 S3

5501-380

51305072-600

HIMatrix F35 011 30

PW482-51 S2

8400-016

51196041-100

HIMatrix F35 010 30

ADV551-P50 S2

5437-672